Cleaning and liquid contact with solids – Apparatus – Automatic controls
Reexamination Certificate
2007-07-03
2007-07-03
Barr, Michael (Department: 1746)
Cleaning and liquid contact with solids
Apparatus
Automatic controls
C134S102100, C134S902000
Reexamination Certificate
active
10463064
ABSTRACT:
Provided is a substrate processing apparatus capable of supplying pure water that is stabilized with respect to the concentration of nitrogen gas. First and second nitrogen concentration meters to measure the nitrogen gas concentration of pure water are respectively disposed before and after a concentration change part that can dissolve and degas nitrogen gas by using a hollow fiber type separation membrane. In order to maintain the nitrogen gas concentration of pure water at a target concentration value, the dissolution and degassing in the concentration change part are controlled by adjusting the degree to which a first valve on a nitrogen gas supply path and a second valve on a nitrogen gas degassing path are opened, based on a concentration difference between a target concentration and both of the first and second nitrogen concentration meters.
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English translation of Abstract for Japanese Patent Application Laid-Open No. 8-196879 (1996).
Barr Michael
Dainippon Screen Mfg. Co,. Ltd.
Husband Sarah E.
Ostrolenk Faber Gerb & Soffen, LLP
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