Substrate processing apparatus

Cleaning and liquid contact with solids – Apparatus – Sequential work treating receptacles or stations with means...

Reexamination Certificate

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Details

C134S140000, C134S902000

Reexamination Certificate

active

07549428

ABSTRACT:
A substrate processing apparatus includes a photosensor for detecting the presence/absence of a substrate in each place within a carrier cassette, a pair of processing tanks for performing the same process at the same time, and a supply mechanism for supplying a processing solution to the processing tanks independently. The number of substrates is detected in accordance with the result of the detection of the photosensor. If the number of substrates detected is not greater than an allowable number for one of the processing tanks, the processing solution is supplied to only the one processing tank to perform the process. This reduces the consumption of the processing solution in a batch process.

REFERENCES:
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patent: 5960562 (1999-10-01), Nishida et al.
patent: 6082381 (2000-07-01), Kamikawa et al.
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patent: 6200387 (2001-03-01), Ni
patent: 6889108 (2005-05-01), Tanaka et al.
patent: 2004/0050408 (2004-03-01), Christenson et al.
patent: 2005/0039779 (2005-02-01), Ohtsuka
patent: 5-152423 (1993-06-01), None
patent: 7-169822 (1995-07-01), None
patent: 11-145241 (1999-05-01), None

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