Cleaning and liquid contact with solids – Apparatus – Sequential work treating receptacles or stations with means...
Reexamination Certificate
2005-07-27
2009-06-23
Stinson, Frankie L (Department: 1792)
Cleaning and liquid contact with solids
Apparatus
Sequential work treating receptacles or stations with means...
C134S140000, C134S902000
Reexamination Certificate
active
07549428
ABSTRACT:
A substrate processing apparatus includes a photosensor for detecting the presence/absence of a substrate in each place within a carrier cassette, a pair of processing tanks for performing the same process at the same time, and a supply mechanism for supplying a processing solution to the processing tanks independently. The number of substrates is detected in accordance with the result of the detection of the photosensor. If the number of substrates detected is not greater than an allowable number for one of the processing tanks, the processing solution is supplied to only the one processing tank to perform the process. This reduces the consumption of the processing solution in a batch process.
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Araki Hiroyuki
Masuda Hiroshi
Dainippon Screen Mfg. Co,. Ltd.
Ostrolenk Faber LLP
Stinson Frankie L
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