Substrate processing apparatus

Abrading – Precision device or process - or with condition responsive... – By optical sensor

Reexamination Certificate

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Details

C451S008000, C451S067000, C451S297000, C451S302000, C451S303000, C451S311000, C451S339000, C451S451000

Reexamination Certificate

active

07066787

ABSTRACT:
A substrate processing apparatus is used for removing surface irregularities occurring on a peripheral portion (a bevel portion, an edge portion, and a notch) of a substrate, such as a semiconductor wafer, and films deposited as a contaminant on the peripheral portion of such a substrate. The substrate processing apparatus includes an edge-portion polisher for pressing a polishing tape against an edge portion of a substrate and causing relative movement between the polishing tape and the substrate to polish the edge portion of the substrate, and a bevel-portion polisher for pressing a polishing tape against a bevel portion of the substrate and causing relative movement between this polishing tape and the substrate to polish the bevel portion of the substrate.

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patent: 2003/0139049 (2003-07-01), Nakamura et al.
patent: 2004/0106363 (2004-06-01), Ishii et al.
patent: 2003-163188 (2003-06-01), None
patent: 2003-234314 (2003-08-01), None

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