Substrate processing apparatus

Details Substrate processing apparatus Substrate processing apparatus

2011-06-14

2011-06-14

Perrin, Joseph L (Department: 1711)

Cleaning and liquid contact with solids

Apparatus

With means for collecting escaping material

C134S902000, C156S345100, C156S345180

Reexamination Certificate

active

07958898

ABSTRACT:
An substrate processing apparatus includes a substrate holding unit, a process liquid supplying unit, a first guide portion provided around the substrate holding unit for guiding the process liquid scattered from the substrate, a second guide portion provided outside the first guide portion for guiding the process liquid scattered from the substrate, a third guide portion provided outside the second guide portion for guiding the process liquid scattered from the substrate, a first recovery channel provided outside the first guide portion integrally with the first guide portion for recovering the process liquid guided by the second guide portion, a second recovery channel provided outside the first recovery channel integrally with the first guide portion for recovering the process liquid guided by the third guide portion, and a driving mechanism for independently moving up and down the first, second, and third guide portions.

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Machine Translation of JP 2004265910 to Harano, Sep. 2004.
Machine Translation of JP 2004080054 to Kamiyama, Mar. 2004.
Office Action issued Dec. 19, 2008 in connection with the corresponding Korean Patent Application No. 10-2007-0097290.
Office Action issued in connection with corresponding U.S. Appl. No. 11/396,700.
Korean Notice of Allowance issued on Aug. 28, 2009 in corresponding Korean Patent Application No. 10-2007-0097290 (Korean language).

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