Substrate processing apparatus

Material or article handling – Apparatus for moving material between zones having different...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C414S222120, C414S939000

Reexamination Certificate

active

07874781

ABSTRACT:
A substrate processing apparatus includes a plurality of process chambers (20) for applying a process to substrate accommodated therein and a conveyance case (24) that conveys the accommodated substrates to the process chambers (20) and a transfer mechanism that moves the conveyance case (24) along a moving path. The conveyance case accommodates the substrates in an isolated state from an external atmosphere. The plurality of process chambers (20) are arranged in an aligned state on both sides of a moving path of the conveyance case (24). The conveyance case (24) has two conveyance ports (24a) in response to conveyance ports (20a) of the process chambers (20) arranged in alignment in two rows.

REFERENCES:
patent: 4976610 (1990-12-01), Yates
patent: 5571330 (1996-11-01), Kyogoku
patent: 6427096 (2002-07-01), Lewis et al.
patent: 6709521 (2004-03-01), Hiroki
patent: 6749390 (2004-06-01), Woodruff et al.
patent: 7575406 (2009-08-01), Hofmeister et al.
patent: 2005/0238464 (2005-10-01), Matsuoka et al.
patent: 03-184331 (1991-08-01), None
patent: 06-097258 (1994-04-01), None
patent: 07-231028 (1995-08-01), None
patent: 09-162263 (1997-06-01), None
patent: 10-056051 (1998-02-01), None
patent: 11-284048 (1999-10-01), None
patent: 11-345859 (1999-12-01), None
International Search Report (Nine (9) pages) dated Nov. 30, 2004 including English Translation.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Substrate processing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Substrate processing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate processing apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2680882

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.