Substrate processing apparatus

Details Substrate processing apparatus Substrate processing apparatus

2011-05-10

2011-05-10

Barr, Michael (Department: 1711)

Cleaning and liquid contact with solids

Apparatus

With means to movably mount or movably support the work or...

C134S094100, C134S095100, C134S104200, C134S902000

Reexamination Certificate

active

07938129

ABSTRACT:
A substrate processing apparatus of the present invention is to apply processing using a processing liquid to a substrate. The substrate processing apparatus includes a first-side plate disposed oppositely to a first surface of the substrate with a distance and provided with plural discharge ports and suction ports in a surface opposing the first surface, a first-side processing liquid supply mechanism that supplies a processing liquid to the discharge ports in the first-side plate, and a first-side suction mechanism that sucks insides of the suction ports in the first-side plate.

REFERENCES:
patent: 6022417 (2000-02-01), Sumnitsch
patent: 6203218 (2001-03-01), Omori et al.
patent: 6247479 (2001-06-01), Taniyama et al.
patent: 6523572 (2003-02-01), Levin et al.
patent: 6644703 (2003-11-01), Levin et al.
patent: 2003/0034056 (2003-02-01), Amai et al.
patent: 2003/0178134 (2003-09-01), Muramoto et al.
patent: 2003/0226577 (2003-12-01), Orll et al.
patent: 2004/0031503 (2004-02-01), Eitoku
patent: 2004/0106072 (2004-06-01), Itoh et al.
patent: 2004/0216841 (2004-11-01), Ito et al.
patent: 2004/0261817 (2004-12-01), Araki et al.
patent: 2005/0079639 (2005-04-01), Itoh et al.
patent: 2005/0081996 (2005-04-01), Itoh et al.
patent: 2005/0106511 (2005-05-01), Itoh et al.
patent: 2005/0126605 (2005-06-01), Yassour et al.
patent: 2006/0045652 (2006-03-01), Miya
patent: 2007/0221253 (2007-09-01), Nishikido
patent: 8-186079 (1996-07-01), None
patent: 2001-68449 (2001-03-01), None
patent: 2004-363200 (2004-12-01), None
patent: 2005-15913 (2005-01-01), None
patent: 2005-340661 (2005-12-01), None
patent: 2006-19545 (2006-01-01), None
patent: 2000-0012105 (2000-02-01), None
patent: 2003-0076267 (2003-09-01), None
patent: 402767 (2000-08-01), None
patent: 554401 (2003-09-01), None
patent: 564474 (2003-12-01), None
patent: 243407 (2005-11-01), None
patent: WO 03/061354 (2003-07-01), None
Machine Translation of JP 2001-68449 to Fukuzawa, Mar. 2001.
Office Action issued on Jan. 9, 2009 in connection with corresponding Chinese Patent Application No. 200710006225.8.
Korean Office Action issued Feb. 29, 2008 in connection with the corresponding Korean Application No. 10-2007-0012474.
Korean Office Action (Notice of Allowance) issued on Aug. 28, 2008 in connection with corresponding Korean Application No. 10-2007-0012474. KR2000-0012105 was previously submitted in an IDS filed Apr. 1, 2008 and is therefore not enclosed.
Taiwan Office Action issued Apr. 9, 2010 in connection with corresponding Taiwanese Patent Application No. 096104389.

Affiliated with

Also associated with

Rating

Substrate processing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Substrate processing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate processing apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2654497