Substrate processing apparatus

Details Substrate processing apparatus Substrate processing apparatus

1987-07-08

1989-05-02

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118715, 118723, 118725, 156345, 204298, 414217, C23C 1400, C23C 1600

Patent

active

048258083

ABSTRACT:
A substrate processing apparatus includes input and output chambers for loading and unloading substrates into and out of the apparatus, a separation chamber connected to the input and output chambers, a plurality of substrate processing chambers connected to the separation chamber for processing the substrates therein, and gate valves provided between the separation chamber and the input and output chambers and between the separation chamber and the respective substrate processing chambers for selectively providing communication between the chambers between which the gate valves are arranged. The separation chamber is able to transfer the substrates therethrough, to distribute the substrate into the respective processing chambers and to temporarily maintain the substrate in the separation chamber. With this arrangement, the substrate processing apparatus is capable of effecting different processings of substrates by freely selecting the kinds, orders and repetitions of the processing for the substrates without any interference between these processings.

REFERENCES:
patent: 4592306 (1986-06-01), Gallego

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