Substrate processing apparatus

Details Substrate processing apparatus Substrate processing apparatus

2008-07-18

2011-10-25

Barr, Michael (Department: 1711)

Cleaning and liquid contact with solids

Apparatus

With means to movably mount or movably support the work or...

C427S240000, C118S052000

Reexamination Certificate

active

08042560

ABSTRACT:
A substrate processing apparatus includes a rotary cup disposed outside a substrate holding member to surround a substrate held on the substrate holding member and to rotate along with the substrate holding member, and having a wall portion that receives a process liquid thrown off from the substrate being rotated. Further, this apparatus includes an exhaust and drain cup disposed outside the rotary cup to surround the rotary cup and the substrate holding member, and including an annular liquid receptacle that receives the process liquid thrown off from the substrate being rotated and an inner annular space formed on an inward side from the annular liquid receptacle. An exhaust mechanism is connected to the inner annular space of the exhaust and drain cup.

REFERENCES:
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Office Action mailed on Nov. 16, 2010, in Japanese Patent Application No. 2006-207044 (with partial translation).
Japanese Office Action issued on May 17, 2011 for Application No. 2007-198826 with English translation.

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