Substrate processing apparatus

Details Substrate processing apparatus Substrate processing apparatus

2005-11-10

2010-02-09

Mathews, Alan A (Department: 2851)

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

C355S027000

Reexamination Certificate

active

07658560

ABSTRACT:
An interface transport mechanism uses an upper hand when transporting a substrate from a substrate platform to an exposure device before exposure processing by an exposure device, and uses a lower hand when transporting the substrate from the exposure device to the substrate platform after the exposure processing by the exposure device. That is, the lower hand is used to transport a substrate to which a liquid is attached after exposure processing, and the upper hand is used to transport a substrate to which no liquid is attached before exposure processing.

REFERENCES:
patent: 4985722 (1991-01-01), Ushijima et al.
patent: 5202716 (1993-04-01), Tateyama et al.
patent: 5339128 (1994-08-01), Tateyama et al.
patent: 5442416 (1995-08-01), Tateyama et al.
patent: 5788868 (1998-08-01), Itaba et al.
patent: 6230721 (2001-05-01), Miyasako
patent: 6585430 (2003-07-01), Matsuyama et al.
patent: 6893171 (2005-05-01), Fukutomi et al.
patent: 2003/0213431 (2003-11-01), Fukutomi et al.
patent: 2004/0182318 (2004-09-01), Hashinoki et al.
patent: 5-178416 (1993-07-01), None
patent: 9-74126 (1997-03-01), None
patent: 9-74127 (1997-03-01), None
patent: 10-135304 (1998-05-01), None
patent: 10-308430 (1998-11-01), None
patent: 2000-100722 (2000-04-01), None
patent: 2001-319856 (2001-11-01), None
patent: 2003-324139 (2003-11-01), None
patent: 2005-197469 (2005-07-01), None
patent: 2005-294520 (2005-10-01), None
patent: WO/99-49504 (1999-09-01), None
English Translation of JP 2001-319856 A (dated Nov. 16, 2001).
Office Action in the counterpart Chinese patent application (200510120441.6) issued May 18, 2007 with the English Language Translation.
Notice of Reasons of Refusal issued Sep. 1, 2009 in connection with counterpart Japanese Patent Application No. 2004-326310.

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