Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Reexamination Certificate
2005-10-18
2005-10-18
Markoff, Alexander (Department: 1746)
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
C134S001300, C134S184000, C134S902000
Reexamination Certificate
active
06955727
ABSTRACT:
A system and method for improving the efficiency and effectiveness of the transmission of acoustical energy to process fluids during substrate processing, such as cleaning or photoresist stripping. The invention utilizes a layered stack of materials to transmit acoustical energy from a source of acoustical energy to the process fluid. The material of which each layer is constructed is chosen so as to reduce the differences in acoustical impedance between consecutive layers of the stack, providing a more gradual transition, in terms of acoustical impedance, when acoustical energy is being transmitted from the source to the process fluid. In one aspect, the invention is a system comprising: a process chamber for receiving a process fluid; an acoustical energy source; and an acoustical stack having a first transmission layer and a second transmission layer that forms an acoustical energy pathway from the acoustical energy source to the process fluid in the process chamber.
REFERENCES:
patent: 4736760 (1988-04-01), Coberly
patent: 4804007 (1989-02-01), Bran
patent: 4859278 (1989-09-01), Bran
patent: 4977688 (1990-12-01), Roberson et al.
patent: 4998549 (1991-03-01), Bran
patent: 5037481 (1991-08-01), Bran
patent: 5355048 (1994-10-01), Estes
patent: 6188162 (2001-02-01), Vennerbeck
patent: 6189552 (2001-02-01), Oshinowo
patent: 6222305 (2001-04-01), Beck et al.
patent: 2002/0050768 (2002-05-01), Beck
Geng Xuecang
Korbler John
Akrion LLC
Belles, Esq. Brian L.
Cozen O'Connor P.C.
Fein, Esq. Michael B.
Markoff Alexander
LandOfFree
Substrate process tank with acoustical source transmission... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Substrate process tank with acoustical source transmission..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate process tank with acoustical source transmission... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3465856