Coating apparatus – Gas or vapor deposition – Work support
Patent
1997-08-15
2000-07-18
Resan, Stevan A.
Coating apparatus
Gas or vapor deposition
Work support
118500, 156345WH, 156345PW, C23C 1600
Patent
active
060902124
ABSTRACT:
A platform for processing a substrate includes a first member and a second member. The first member includes a first support surface for supporting the substrate during processing. The second member includes a second support surface, which supports the first member thereon, and a third support surface, which is adapted to be supported in a processing chamber. The first and second members are releasably coupled together in a manner which permits unrestrained relative thermal expansion of the two members and also of the substrate. The platform is suitable for use in a processing reactor which includes a heater housing and an outer reactor housing. The heater housing encloses a heater assembly and provides a surface for supporting the platform during processing. The reactor also includes a gas injector for injecting at least one processing gas into the processing chamber for deposition on the substrate.
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Micro C Technologies, Inc.
Resan Stevan A.
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