Substrate patterning by electron emission-induced displacement

Details Substrate patterning by electron emission-induced displacement Substrate patterning by electron emission-induced displacement

2008-10-01

2010-10-19

Wells, Nikita (Department: 2881)

Scanning-probe techniques or apparatus; applications of scanning

Scanning or positioning arrangements, i.e., arrangements for...

C850S005000, C850S033000, C250S306000, C250S310000, C073S105000

Reexamination Certificate

active

07818816

ABSTRACT:
Disclosed are methods and devices for patterning micro- and/or nano-sized pattern elements on a substrate using field emitted electrons from an element. Disclosed methods and devices can also be utilized to form nano- and micron-sized depressions in a substrate according to a more economical process than as has been utilized in the past. Methods include single-step methods by which structures can be simultaneously created and located at desired locations on a substrate. Methods include the application of a bias voltage between a probe tip and a substrate held at a relatively close gap distance. The applied voltage can promote current flow between the probe and the substrate via field emissions. During a voltage pulse, and within predetermined energy levels and tip-to-surface gap distances, three dimensional formations can be developed on the substrate surface.

REFERENCES:
patent: 5412980 (1995-05-01), Elings et al.
patent: 5849173 (1998-12-01), Chandross et al.
patent: 5861549 (1999-01-01), Neukermans et al.
patent: 6279389 (2001-08-01), Adderton et al.
patent: 6997039 (2006-02-01), Rao et al.
patent: 7514214 (2009-04-01), Wade et al.
patent: 7687876 (2010-03-01), Kabir
patent: 2003/0222668 (2003-12-01), Hung et al.
patent: 2007/0194225 (2007-08-01), Zorn
Brongersma, et al., “Electromagnetic energy transfer and switching in nanoparticle chain arrays below the diffraction limit”, vol. 62, No. 24, Dec. 2000.

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