Etching a substrate: processes – Forming or treating thermal ink jet article
Reexamination Certificate
2004-04-29
2008-09-30
Norton, Nadine (Department: 1792)
Etching a substrate: processes
Forming or treating thermal ink jet article
C216S017000, C347S054000
Reexamination Certificate
active
07429335
ABSTRACT:
A method for forming an opening through a substrate includes removing a first portion of a first face of a substrate to form a first recessed surface oblique to the first face and removing a second portion of the substrate to form a passage extending through the substrate such that the passage is bordered by the first surface.
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□□S. Wolf and R.N. Tauber, (Silicon Processing for the VLSI Era, vol. 1- Process Technology, Lattice Press, 1986, p. 532.
Dahimene Mahmoud
Norton Nadine
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