Substrate orientation in a gas-atomizing spray-depositing appara

Details Substrate orientation in a gas-atomizing spray-depositing appara Substrate orientation in a gas-atomizing spray-depositing appara

1988-09-20

1990-10-30

Lin, Kuang Y.

Metal founding

Means to shape metallic material

Continuous or semicontinuous casting

164 46, B22D 1106, C23C 412

Patent

active

049662244

ABSTRACT:
A molten metal gas-atomizing spray-depositing apparatus has an atomizer for atomizing a stream of molten metal into metal particles in a divergent spray pattern thereof being of higher temperature at a center region of the pattern than at an outer peripheral region thereof. A substrate is continuously movable along an endless path and has an area thereon disposed below the atomizer for receiving a deposit of the particles in the spray pattern to form a product on the substrate being substantially uniform in thickness. The deposit-receiving substrate area has consecutively arranged upstream, intermediate and downstream portions upon which respective inner, intermediate and outer cross-sectional portions of the metal deposit are layered one upon the next to form the product. The substrate area is oriented in inclined configuration in one form and in concave configuration in another form relative to a vertical axis of the divergent spray pattern such that particles in the spray pattern travel through at least as great a distance (and preferably a greater distance) to reach the intermediate portion of substrate area as particles in the spray pattern travel to reach the upstream portion thereof.

REFERENCES:
patent: Re31767 (1984-12-01), Brooks
patent: 2559351 (1951-07-01), Drake et al.
patent: 2972185 (1961-02-01), Brennan
patent: 3608615 (1971-09-01), Conlon
patent: 3727672 (1973-04-01), Grenfell
patent: 3742585 (1973-07-01), Wentzell
patent: 3775156 (1973-11-01), Singer
patent: 3826301 (1974-07-01), Brooks
patent: 3909921 (1975-10-01), Brooks
patent: 4512384 (1985-04-01), Sendzimir
patent: 4522847 (1985-06-01), Cornet et al.
patent: 4546815 (1985-10-01), Liebermann et al.
patent: 4582117 (1986-04-01), Kushnick
patent: 4588021 (1986-05-01), Bergeron et al.
patent: 4642130 (1987-02-01), Hargreaves et al.
patent: 4721154 (1988-01-01), Christ et al.
R. W. Evans et al., "The Osprey Preform Process", 1985, pp. 13-20, Powder Metallurgy, vol. 28, No. 1.
A. G. Leatham et al., "The Osprey Process For The Production Of Spray-Deposited Roll, Disc, Tube And Billet Preforms", 1985, pp. 157-173, Modern Developments In Powder Metallurgy, vols. 15-17.

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