Substrate mounting table, substrate processing apparatus and...

Details Substrate mounting table, substrate processing apparatus and... Substrate mounting table, substrate processing apparatus and...

2006-03-16

2010-10-19

Kackar, Ram N. (Department: 1716)

Coating apparatus

Gas or vapor deposition

With treating means

C118S725000, C118S728000, C156S345510, C156S345520, C156S345530

Reexamination Certificate

active

07815740

ABSTRACT:
A substrate mounting table includes a plurality of passageways independently provided therein, a temperature control medium flowing through the passageways, and a gap formed between at least two of the passageways. In a substrate processing method for processing a substrate mounted on the substrate mounting table in a substrate processing apparatus while controlling a temperature thereof, a process is performed on the substrate while controlling the temperature of the substrate by flowing the temperature control medium through each of the passageways. The passageways are respectively provided in a central area of the substrate mounting table and a peripheral area located outside the central area, and the central area and the peripheral area are thermally isolated from each other by evacuating the gap so as to set the gap to a vacuum state.

REFERENCES:
patent: 6432203 (2002-08-01), Black et al.
patent: 6677167 (2004-01-01), Kanno et al.
patent: 2004/0115947 (2004-06-01), Fink et al.
patent: 2004/0187787 (2004-09-01), Dawson et al.
patent: 2006/0027169 (2006-02-01), Tsukamoto et al.

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