Substrate mounting structure and substrate processing apparatus

Coating apparatus – Gas or vapor deposition – With treating means

Reexamination Certificate

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Details

C118S715000, C118S722000, C118S724000, C156S345510, C156S345520

Reexamination Certificate

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07959734

ABSTRACT:
A substrate mounting structure that can maintain the temperature uniformity of a substrate mounted on a mounting stage. The substrate mounting structure disposed in a pressure reduced space has a base portion, a pillar portion mounted in a standing manner on the base portion and having an internal space, and a mounting stage supported on the pillar portion and having a substrate mounted thereon. The mounting stage has a heating element that heats the mounted substrate, and a thermal breaking unit that mechanically breaks an electrical power supply line connected to the heating element depending on the temperature of the substrate. The pillar portion is comprised of a thin-walled cylinder. The thermal breaking unit is disposed on the pillar portion's internal space side in the mounting stage, and the pressure in the internal space is reduced.

REFERENCES:
patent: 4894634 (1990-01-01), Nezuka et al.
patent: 5968379 (1999-10-01), Zhao et al.
patent: 6756568 (2004-06-01), Furukawa
patent: 7045747 (2006-05-01), Futakuchiya et al.
patent: 2003/0057198 (2003-03-01), Kobayashi et al.
patent: 2004/0168641 (2004-09-01), Kuibira et al.
patent: 2006/0169688 (2006-08-01), Mori et al.
patent: 2003-124201 (2003-04-01), None

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