Substrate inspecting device, coating/developing device and...

Radiant energy – Photocells; circuits and apparatus – Photocell controls its own optical systems

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S559390, C356S394000, C356S237200

Reexamination Certificate

active

06974963

ABSTRACT:
When a base film of a substrate is formed, for instance, on a scribe line of a wafer, a quadrangular first inspection pattern is formed in advance, and when a resist pattern is formed, a second inspection pattern are formed so as to be on a straight line to the first inspection pattern in a top plan view. When light is irradiated to a region including the first inspection pattern and the second inspection pattern and a spectrum is formed based on the reflected diffracted light, information of a line width of the second inspection pattern and a pitch of both inspection patterns is contained therein. In this connection, by preparing in advance a group of spectra based on various kinds of inspection patterns according to simulation and by comparing with an actual spectrum, the most approximate spectrum is selected, and thereby the line width and the pitch are estimated to evaluate the resist pattern.

REFERENCES:
patent: 5361137 (1994-11-01), Aton et al.
patent: 63-237521 (1988-10-01), None
patent: 5-136025 (1993-06-01), None
patent: 7-22307 (1995-01-01), None
patent: 11-340115 (1999-12-01), None
patent: 2002-15980 (2002-01-01), None
patent: 00/57126 (2000-09-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Substrate inspecting device, coating/developing device and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Substrate inspecting device, coating/developing device and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate inspecting device, coating/developing device and... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3469055

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.