Substrate holding device, substrate processing system and...

Details Substrate holding device, substrate processing system and... Substrate holding device, substrate processing system and...

2011-04-12

2011-04-12

McDonald, Rodney G (Department: 1724)

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C204S298250, C118S728000, C118S729000, C118S668000, C118S669000

Reexamination Certificate

active

07922882

ABSTRACT:
In holding a substrate p loaded at a specified position on a holder30by clamping a peripheral region of the substrate p against the holder30through a plurality of engagement elements32, it can be avoided that when the substrate p is offset from the specified position and its peripheral region gets on one or some of the engagement elements32, the substrate p is processed with the peripheral region getting on the engagement element32.A substrate holding device includes: a plurality of detector sensors80for detecting the peripheral region of the substrate p if the substrate p is placed at the specified position on the holder30; and a determination unit90for determining that the substrate p is offset from the specified position when at least one of the detector sensors80did not detect the associated part of the substrate p.

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