Substrate holding device and polishing apparatus

Details Substrate holding device and polishing apparatus Substrate holding device and polishing apparatus

2005-12-06

2009-12-22

Morgan, Eileen P. (Department: 3723)

Abrading

Machine

Rotary tool

C451S398000, C451S402000

Reexamination Certificate

active

07635292

ABSTRACT:
A substrate holding device according to the present invention includes an elastic membrane to be brought into contact with a rear surface of a substrate, an attachment member for securing at least a portion of the elastic membrane, and a retainer ring for holding a peripheral portion of the substrate while in contact with the elastic membrane. The elastic membrane comprises at least one projecting portion, and the attachment member comprises at least one engagement portion engaging side surfaces of the at least one projecting portion of the elastic membrane. The elastic membrane further comprises bellows portions expandable in a pressing direction so as to allow the elastic membrane to press the substrate, and contractible along the pressing direction.

REFERENCES:
patent: 4918869 (1990-04-01), Kitta
patent: 5624299 (1997-04-01), Shendon
patent: 5913718 (1999-06-01), Shendon
patent: 5938884 (1999-08-01), Hoshizaki et al.
patent: 5985094 (1999-11-01), Mosca
patent: 6056632 (2000-05-01), Mitchel et al.
patent: 6080050 (2000-06-01), Chen et al.
patent: 6106379 (2000-08-01), Mosca
patent: 6132298 (2000-10-01), Zuniga et al.
patent: 6159079 (2000-12-01), Zuniga et al.
patent: 6162116 (2000-12-01), Zuniga et al.
patent: 6183354 (2001-02-01), Zuniga et al.
patent: 6210255 (2001-04-01), Zuniga et al.
patent: 6244942 (2001-06-01), Zuniga
patent: 6277010 (2001-08-01), Perlov et al.
patent: 6277014 (2001-08-01), Chen et al.
patent: 6358121 (2002-03-01), Zuniga
patent: 6361420 (2002-03-01), Zuniga et al.
patent: 6406361 (2002-06-01), Zuniga et al.
patent: 6443823 (2002-09-01), Tolles et al.
patent: 6645044 (2003-11-01), Zuniga
patent: 6676497 (2004-01-01), Chen et al.
patent: 6857945 (2005-02-01), Chen et al.
patent: 2002/0081955 (2002-06-01), Numoto
patent: 2002/0086624 (2002-07-01), Zuniga et al.
patent: 2002/0151251 (2002-10-01), Zuniga
patent: 2004/0005842 (2004-01-01), Chen et al.
patent: 2004/0067719 (2004-04-01), Zuniga
patent: 2004/0192173 (2004-09-01), Zuniga et al.
patent: 2005/0142993 (2005-06-01), Chen et al.
patent: 2006/0194519 (2006-08-01), Fuhriman et al.
patent: 2006/0199479 (2006-09-01), Togawa et al.
patent: 2007/0010181 (2007-01-01), Spiegel
patent: 2008/0166957 (2008-07-01), Togawa et al.
patent: 0 859 399 (1998-08-01), None
patent: 1 066 924 (2001-01-01), None
patent: 1066924 (2001-01-01), None
patent: 1080841 (2001-03-01), None
patent: 2000-127026 (2000-05-01), None
patent: 2001-038604 (2001-02-01), None
patent: 2004-516644 (2004-06-01), None
patent: 2004-297029 (2004-10-01), None
patent: 02/07931 (2002-01-01), None
patent: 2004/070806 (2004-08-01), None
Translation of the Chinese Office Action issued Sep. 26, 2008 in connection with Chinese Patent Application No. 200580042189X corresponding to the present U.S. application.

Affiliated with

Also associated with

Rating

Substrate holding device and polishing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Substrate holding device and polishing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate holding device and polishing apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4114500