Abrading – Precision device or process - or with condition responsive... – With feeding of tool or work holder
Reexamination Certificate
2007-01-02
2007-01-02
Thomas, David B. (Department: 3723)
Abrading
Precision device or process - or with condition responsive...
With feeding of tool or work holder
C451S007000, C451S053000, C451S287000
Reexamination Certificate
active
11082729
ABSTRACT:
A substrate holding apparatus can accurately control temperature of a substrate in a direct manner with a relatively simple arrangement. The substrate holding apparatus has a top ring configured to hold a substrate to be polished and press the substrate against a polishing surface, and an air bag attached to the top ring so as to be brought into contact with a rear face of the substrate. The substrate holding apparatus also has a regulator operable to regulate a temperature control fluid to be supplied into the air bag, and a flow regulating valve operable to regulate a flow rate of the temperature control fluid discharged from the air bag.
REFERENCES:
patent: 2253866 (1941-08-01), Quoos
patent: 5938512 (1999-08-01), Takei et al.
patent: 6012967 (2000-01-01), Satake et al.
patent: 6059921 (2000-05-01), Kato et al.
patent: 6077437 (2000-06-01), Hayashi et al.
patent: 6354922 (2002-03-01), Sakurai et al.
patent: 6402597 (2002-06-01), Sakurai et al.
patent: 6416402 (2002-07-01), Moore
patent: 6419558 (2002-07-01), Watanabe et al.
patent: 6645050 (2003-11-01), Butterfield et al.
patent: 6726529 (2004-04-01), Marcyk et al.
patent: 2002/0042246 (2002-04-01), Togawa et al.
patent: 2002/0160702 (2002-10-01), Kishida et al.
patent: 2002/0187728 (2002-12-01), Kiuchi et al.
patent: 2003/0027506 (2003-02-01), Herb et al.
patent: 2003/0203708 (2003-10-01), Liu et al.
patent: 2004/0198184 (2004-10-01), Joslyn
patent: 2005/0054272 (2005-03-01), Takahashi et al.
patent: 2005/0191949 (2005-09-01), Kamimura et al.
patent: 11-307486 (1999-11-01), None
patent: 2000-353677 (2000-12-01), None
Saito Koji
Sameshima Katsumi
Ebara Corporation
Scruggs Robert
Thomas David B.
Wenderoth , Lind & Ponack, L.L.P.
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