Substrate holder for molecular beam epitaxy apparatus

Details Substrate holder for molecular beam epitaxy apparatus Substrate holder for molecular beam epitaxy apparatus

1985-02-27

1986-07-08

Camby, John J.

Heating

Accessory means for holding, shielding or supporting work...

118 501, 118725, 219354, 219520, 373 10, 432226, F27D 500, C23C 1400, F24H 300, H01J 37305

Patent

active

045990697

ABSTRACT:
For use in placing a semiconductor substrate in molecular beam epitaxy apparatus, a holder comprises a heat conductor member opposite to a substrate. The substrate is received in a space formed in a supporting member and is in engagement with a flange portion radially inwardly projected from a peripheral surface of the space. The heat conductor member is heated by a heater in the molecular beam epitaxy apparatus. This results in effective conduction of heat to the substrate. The substrate is easily put in the beam epitaxy apparatus and removed therefrom. The heat conductor member may be of pyrolytic graphite or sintered graphite.

REFERENCES:
patent: 3845738 (1974-11-01), Berkman et al.
patent: 4066037 (1978-01-01), Jacob
patent: 4356384 (1982-10-01), Gat

Affiliated with

Also associated with

Rating

Substrate holder for molecular beam epitaxy apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Substrate holder for molecular beam epitaxy apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate holder for molecular beam epitaxy apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1449369