Substrate holder, and system and method for cleaning and drying

Details Substrate holder, and system and method for cleaning and drying Substrate holder, and system and method for cleaning and drying

1999-02-18

2000-12-12

Gibson, Jr., Robert W.

Supports: racks

Special article

Platelike

206454, 134 30, 118500, A47F 700

Patent

active

061585963

ABSTRACT:
In a wafer transport chuck 10 for holding wafers W by means of a pair of holding members 11, each of the holding members 11 has an upper holding portion 12 and a lower holding portion 13 which project from the upper and lower portions of a surface facing another holding member 11, respectively. Each of the upper holding portion 12 and the lower holding portion 13 has a circular arc surface facing the held portions of the wafers W. The upper holding portion 12 has a plurality of upper holding grooves 12a, and the lower holding portion 13 has a plurality of lower holding grooves 13a. Thus, it is possible to make the substrate holder smaller without reducing the strength thereof, and it is possible to improve the cleaning and drying efficiency, so that it is possible to reduce cleaning and drying time and to improve throughput.

REFERENCES:
patent: 5033406 (1991-07-01), Lee
patent: 5379784 (1995-01-01), Nishi et al.
patent: 5503173 (1996-04-01), Kudo et al.
patent: 5505577 (1996-04-01), Nishi
patent: 5853496 (1998-12-01), Honda

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