Substrate heating apparatus for forming thin films on substrate

Details Substrate heating apparatus for forming thin films on substrate Substrate heating apparatus for forming thin films on substrate

1990-12-21

1992-06-09

Reynolds, Bruce A.

Coating apparatus

Gas or vapor deposition

With treating means

219390, 118724, C23C 1646, F27D 1100

Patent

active

051197618

ABSTRACT:
An improved substrate heating apparatus for use in a low-pressure CVD technique is provided. The apparatus comprises a substrate fixing member whose surface is coated with a heat reflector that reflects heat generated by a substrate heater. By virtue of this heat reflector, the surface temperature of the substrate fixing member can be maintained significantly lower than that of a substrate to be processed. Thus undesirable, thin film deposition on the surface of the substrate fixing member can be effectively suppressed. As a result, wasteful material gas consumption can be minimized, and the rate of forming thin films on the substrate surface can be held substantially constant.

REFERENCES:
patent: 4556785 (1985-12-01), Blechschmid et al.
patent: 4579080 (1986-04-01), Martin et al.
patent: 4771730 (1988-09-01), Tezuka

Affiliated with

Also associated with

Rating

Substrate heating apparatus for forming thin films on substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Substrate heating apparatus for forming thin films on substrate , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate heating apparatus for forming thin films on substrate will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1797687