Coating apparatus – Gas or vapor deposition – With treating means
Patent
1994-03-31
1996-09-10
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
With treating means
118730, 20429809, C23C 1600
Patent
active
055542247
ABSTRACT:
A substrate heater for thin film deposition of metallic oxides upon a target substrate configured as a disk including means for supporting in a predetermined location a target substrate configured as a disk, means for rotating the target substrate within the support means, means for heating the target substrate within the support means, the heating means about the support means and including a pair of heating elements with one heater element situated on each side of the predetermined location for the target substrate, with one heater element defining an opening through which desired coating material can enter for thin film deposition and with the heating means including an opening slot through which the target substrate can be entered into the support means, and, optionally a means for thermal shielding of the heating means from surrounding environment is disclosed.
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patent: 5290381 (1994-03-01), Nozawa
patent: 5294778 (1994-03-01), Carman
patent: 5343012 (1994-08-01), Hardy
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James A. Greer et al., "Pulsed Laser Deposition of Oxides Over Large Areas," SPIE Proceedings, vol. 1377-79, Nov. 1990.
R. C. Estler et al., "A Versatile Substrate Heater for Use in Highly Oxidizing Atmospheres," Rev. Sci. Instrum. 62(2), Feb. 1991.
B. Holzapfel et al., "Off-axis Laser Deposition of YBa.sub.2 Cu.sub.3 O.sub.7-.delta. Thin Films," Appl. Phys. Lett. 61(26), 28 Dec. 1992.
M. F. Davis et al., "Deposition of High Quality YBa.sub.2 Cu.sub.3 O.sub.7-.delta. Thin Films Over large Areas by Pulsed Laser Ablation with Substrate Scanning," J. Appl. Phys. 69(10), 15 May 1991.
Breneman R. Bruce
Chang Joni Y.
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