Substrate heat treatment apparatus

Details Substrate heat treatment apparatus Substrate heat treatment apparatus

2006-07-19

2008-12-23

Mathews, Alan A (Department: 2851)

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

C396S571000, C430S311000, C219S444100

Reexamination Certificate

active

07467901

ABSTRACT:
A substrate heat treatment apparatus for heat-treating a substrate includes a bake plate for supporting the substrate, and a cover disposed above the bake plate and temperature-controlled for securing a heat-treating atmosphere of the bake plate. An adjusting device adjusts a space between the cover and the bake plate. A control device adjusts the space, through the adjusting device, successively to a transport space for allowing transport of the substrate, a transitional space smaller than the transport space and close to the bake plate, and a steady space smaller than the transport space and larger than the transitional space.

REFERENCES:
patent: 9-8049 (1997-01-01), None
patent: 10-189429 (1998-07-01), None
patent: 2000-3843 (2000-01-01), None

Affiliated with

Also associated with

Rating

Substrate heat treatment apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Substrate heat treatment apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate heat treatment apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4027081