Substrate heat treatment apparatus

Details Substrate heat treatment apparatus Substrate heat treatment apparatus

2006-05-03

2008-10-07

Paik, Sang Y (Department: 3742)

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

C118S725000

Reexamination Certificate

active

07432476

ABSTRACT:
A substrate heat treatment apparatus for heat-treating a substrate includes a bake plate having projections on an upper surface thereof, a seal unit disposed peripherally of the upper surface of the bake plate for closing a lateral area of a minute space formed between a lower surface of the substrate and the upper surface of the bake plate when the substrate is placed on the bake plate, and exhaust bores for exhausting gas from the minute space. The substrate placed on the bake plate is heat-treated in a state of the gas exhausted from the minute space through the exhaust bores.

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patent: 6394797 (2002-05-01), Sugaya et al.
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patent: 6761771 (2004-07-01), Satoh et al.
patent: 2-290013 (1990-11-01), None
patent: 10-284360 (1998-10-01), None
patent: 2000-193376 (2000-07-01), None

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