Substrate heat-treating apparatus

Details Substrate heat-treating apparatus Substrate heat-treating apparatus

1998-04-14

2000-05-16

Jeffery, John A.

Heating

Accessory means for holding, shielding or supporting work...

Support structure for heat treating ceramics

432253, 432259, 392418, F27D 500

Patent

active

060628529

ABSTRACT:
A substrate heat-treating apparatus includes a heat-treating plate, and support pins extending through the heat-treating plate to be vertically movable relative thereto. The support pins support each substrate at a lower surface thereof such that edges of the substrate are at a higher level than a central region of the substrate. This construction facilitates air flows into and out of a space between the lower surface of the substrate and the upper surface of the heat-treating plate when the substrate is vertically moved.

REFERENCES:
patent: 4591044 (1986-05-01), Ogami et al.
patent: 4919614 (1990-04-01), Kitagawa et al.
patent: 5156820 (1992-10-01), Wong et al.
patent: 5192371 (1993-03-01), Shuto et al.
patent: 5310339 (1994-05-01), Ushikawa
patent: 5595604 (1997-01-01), Kobayashi et al.
patent: 5716207 (1998-02-01), Mishina et al.
patent: 5762745 (1998-06-01), Hirose

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