Substrate handling system

Details Substrate handling system Substrate handling system

2008-05-13

2008-05-13

Kackar, Ram N (Department: 1792)

Coating apparatus

Gas or vapor deposition

Work support

C118S728000, C156S345540, C414S941000

Reexamination Certificate

active

10837842

ABSTRACT:
A substrate handling system and method in which an air chuck produces a film of air between the substrate and the air chuck, a magnetic chuck attracts the substrate to the air chuck, and an actuator subsystem moves the magnetic chuck closer to and away from the air chuck to alternately pick up a substrate and release the substrate.

REFERENCES:
patent: 5495279 (1996-02-01), Sandstrom
patent: 6285102 (2001-09-01), Matsuoka et al.
patent: 6351041 (2002-02-01), Okubo
patent: 6842221 (2005-01-01), Shiraishi
patent: 2003/0169524 (2003-09-01), Adin et al.
patent: 2003/0183611 (2003-10-01), Gregor et al.
patent: 06306559 (1994-11-01), None

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