Substrate handling and processing system

Material or article handling – Apparatus for moving material between zones having different... – For carrying standarized mechanical interface type

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118719, 20429825, 414417, 414DIG5, 414DIG3, B65G 4700

Patent

active

052154203

ABSTRACT:
A system for handling and processing thin substrates, such as substrates for magnetic disks. The system includes a main chamber, entrance and output load locks, a buffer chamber, substrate load/unload mechanism, and a plurality of substrate processing stations positioned contiguous with the main vacuum chamber. The system further includes a transport for moving a plurality of cassettes carrying vertically oriented substrates into the entrance load lock, to the buffer chamber where the substrates are transferred into the main chamber, and to the output load lock where processed substrates are placed back in the cassettes. The substrates are transferred to and from the cassettes to and from the substrate load/unload mechanism by means of dedicated lift blades. The system further employs a simple three-step transfer of the substrates from processing station to processing station which greatly increases the throughput potential compared to prior art systems which rely on complex substrate handling and transfer.

REFERENCES:
patent: 4449885 (1984-05-01), Hertel et al.
patent: 4500407 (1985-02-01), Boys et al.
patent: 4776744 (1988-10-01), Stonestreet et al.
patent: 4790921 (1988-12-01), Bloomquist et al.
patent: 4795299 (1989-01-01), Boys et al.
patent: 4886592 (1989-12-01), Anderle et al.
patent: 4909695 (1990-03-01), Hurwitt et al.
patent: 4981408 (1991-01-01), Hughes et al.
IBM Technical Disclosure Bulletin-vol. 11, No. 7, Dec. 1968, pp. 757 & 758.

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