Substrate for silicon solar cells

Details Substrate for silicon solar cells Substrate for silicon solar cells

1982-03-15

1983-09-06

Smith, John D.

Metal treatment

Process of modifying or maintaining internal physical...

Chemical-heat removing or burning of metal

29572, 148175, 156613, 156DIG69, 427 74, 427 75, 427 86, 427253, H01C 3106

Patent

active

044027710

ABSTRACT:
A substrate is made for silicon solar cells by heating a sheet of large-grained silicon steel at a temperature of at least about 1300.degree. C. in an atmosphere of hydrogen and tungsten hexafluoride (or hexachloride) at a partial pressure ratio of hydrogen to tungsten hexafluoride of about 3 to about 6 to deposit an epitaxial layer of tungsten on said sheet of silicon steel. Epitaxial silicon can then be deposited in a conventional manner on the layer of epitaxial tungsten.

REFERENCES:
patent: 3911194 (1975-10-01), Dejachy et al.
patent: 3961997 (1976-06-01), Chu
Chu et al., "Polycrystalline Silicon on Coated Steel Substrate", Electrochemical Society, vol. 122, pp. 1681-1685, (1975).
Bryant, "The Adherence of Chemically Vapor Deposited Tungsten Coatings", Chem. Vap. Deposition, Second Int. Conf., Electrochemical Soc., pp. 409-421, (1970).
Faron et al., "Study of the Chemical Vapor Deposition of Tungsten and Molybdenum-Reduction of Flourides at High Temperature and Low Pressure", Third Int. Conf. on Chem. Vapor Deposition, Proceedings of American Nuclear Society, pp. 435-452, (1972).
Nicolet, "Diffusion Barriers in Thin Fibers", Thin Solid Films, vol. 52, (1978), pp. 415-443.

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