Substrate for photomask, photomask blank and photomask

Details Substrate for photomask, photomask blank and photomask Substrate for photomask, photomask blank and photomask

2008-01-29

2008-01-29

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C428S428000

Reexamination Certificate

active

10808540

ABSTRACT:
A substrate for photomask has a top surface and a back surface, the substrate being square in shape, an end surface formed along the thickness thereof and a chamfered surface formed on a perimeter edge region where the end surface and the top surface meet and another region where the end surface and the back surface meet, a size of the perimeter edge of the substrate is 300 mm or more on a side and the end surface and the chamfered surface each has a roughened surface having a surface roughness (Ra) ranging from 0.03 μm to 0.3 μm.

REFERENCES:
patent: 6096405 (2000-08-01), Takahashi et al.
patent: 6555273 (2003-04-01), Tanabe
patent: 56-46227 (1981-04-01), None

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