Substrate for manufacturing single crystal thin films

Details Substrate for manufacturing single crystal thin films Substrate for manufacturing single crystal thin films

1986-05-09

1988-01-05

Rutledge, L. Dewayne

Stock material or miscellaneous articles

All metal or with adjacent metals

Microscopic interfacial wave or roughness

428641, 428648, 428658, 428672, 428673, 428680, 156DIG65, 156DIG88, B32B 330

Patent

active

047176300

ABSTRACT:
The invention is directed to a substrate for manufacturing single crystal thin films wherein the substrate is a replica pattern of a monocrystalline or single crystal cleavage plane. Such replica pattern may be formed by pressing a material in a softened state against the cleavage plane of the single crystal, with subsequent hardening, and also, by subjecting the single crystal cleavage plane to vapor deposition or plating, and thereafter removing the formed layer from the single crystal cleavage plane.

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