Abrading – Abrading process – Utilizing fluent abradant
Reexamination Certificate
2005-02-08
2005-02-08
Resan, Stevan A. (Department: 1773)
Abrading
Abrading process
Utilizing fluent abradant
C451S041000, C451S059000, C065S061000
Reexamination Certificate
active
06852010
ABSTRACT:
A substrate for an information recording medium has a microwaviness average height Ra′ not greater than 0.05 microinch as measured by a contactless laser interference technique for measurement points within a measurement region of 50 μm□-4 mm□ on a surface of the substrate. The microwaviness average height Ra′ is given by:Ra′=1n∑i=1n |xi-x_|,where xi represents a measurement point value of each measurement point, {overscore (x)} representing an average value of the measurement point values, n representing the number of said measurement points. Alternatively, the substrate has a waviness period between 300 μm and 5 mm and a waviness average height Wa of 1.0 nm or less as measured by the contactless laser interference technique for measurement points in a measurement region surrounded by two concentric circles which is spaced from a center of a surface of the substrate by a predetermined distance. The waviness average height Wa is given by:Wa=1N∑i=1N |Xi-X_|where Xi represents a measurement point value of each measurement point, {overscore (X)} representing an average value of the measurement point values, n representing the number of said measurement points.
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Hata Genshichi
Miyamoto Takemi
Takahashi Kouji
Tomiyasu Hiroshi
Yokoyama Tomotaka
Hoya Corporation
Resan Stevan A.
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