Substrate for amorphous silicon photoreceptor

Details Substrate for amorphous silicon photoreceptor Substrate for amorphous silicon photoreceptor

1985-07-15

1987-08-11

Martin, Roland E.

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

430 84, G03G 5082, G03G 510

Patent

active

046861653

ABSTRACT:
A substrate for an amorphous silicon photoreceptor prepared by first forming an amorphous silicon photoreceptive layer on an aluminum or aluminum alloy body by using a plasma CVD apparatus, and by arranging so that those crystal grains located in the surface of the substrate each has a diameter of 1 cm or smaller, to thereby make it possible to obtain a satisfactory image stably and repetitively.

REFERENCES:
patent: 4265991 (1981-05-01), Hirai et al.
patent: 4405703 (1983-09-01), Onuma et al.

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