Substrate exposure apparatus with flatness detection and alarm

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Details

2504911, 2504922, 356400, 364490, 364559, G06F 15606, G21K 500

Patent

active

048499013

ABSTRACT:
An exposure apparatus has a moving member which can two-dimensionally move a photosensitive substrate in a direction of a reference plane, which is substantially parallel to or coincides with a predetermined image surface on which an original image is to be formed. Information associated with a distance between the surface of the photosensitive substrate and the reference plane is sequentially detected for each of a plurality of regions on the photosensitive substrate to be exposed, and a flatness of the surface of an exposed region of interest with respect to the predetermined image surface is then detected in accordance with information associated with a distance of the exposed region of interest and information associated with the distances of a plurality of exposed regions surrounding the exposed region of interest among a plurality of detected distance data.

REFERENCES:
patent: 4251160 (1981-02-01), Bouwhuis et al.
patent: 4475223 (1984-10-01), Taniguchi et al.
patent: 4528451 (1985-07-01), Petric et al.
patent: 4584479 (1986-04-01), Lamattina et al.
patent: 4615621 (1986-10-01), Allen et al.

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