Substrate dual-side processing apparatus

Cleaning and liquid contact with solids – Apparatus – With means to movably mount or movably support the work or...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C134S148000, C134S153000, C134S902000, C294S094000

Reexamination Certificate

active

06874515

ABSTRACT:
A substrate dual-side processing apparatus has a processor to apply a specific process to a front surface and a rear surface of a substrate, a reversing unit to reverse the substrate and a substrate-transfer mechanism to transfer the substrate between the processor and the reversing unit. The reversing unit has a holder for holding the substrate when the substrate is being transferred to and from the substrate-transfer mechanism and a rotating mechanism for rotating the substrate, thus the substrate being reversed while held by the holders. The reversing unit may have a pair of holders for holding the substrate at the front and rear surfaces, a drive mechanism for driving the pair of holders so that the holders become close to or apart from each other and a rotating mechanism for rotating the substrate, thus the substrate being reversed while held by the holders.

REFERENCES:
patent: 4815055 (1989-03-01), Fago, Jr.
patent: 4958982 (1990-09-01), Champet et al.
patent: 5202171 (1993-04-01), Anezaki et al.
patent: 5297568 (1994-03-01), Schmid
patent: 5474641 (1995-12-01), Otsuki et al.
patent: 5485644 (1996-01-01), Shinbara et al.
patent: 5498294 (1996-03-01), Matsushita et al.
patent: 5518542 (1996-05-01), Matsukawa et al.
patent: 5520501 (1996-05-01), Kouno et al.
patent: 5686143 (1997-11-01), Matsukawa et al.
patent: 5824153 (1998-10-01), Suda et al.
patent: 5964954 (1999-10-01), Matsukawa et al.
patent: 6258220 (2001-07-01), Dordi et al.
patent: 6261160 (2001-07-01), Hakomori
patent: 6454517 (2002-09-01), Ohno
patent: 6578891 (2003-06-01), Suzuki et al.
patent: 196 41 534 (1998-04-01), None
patent: 63-39971 (1986-02-01), None
patent: 4-160161 (1992-06-01), None
patent: 10-46339 (1998-02-01), None
patent: 11-259946 (1999-09-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Substrate dual-side processing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Substrate dual-side processing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate dual-side processing apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3397985

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.