Substrate drying system

Details Substrate drying system Substrate drying system

2005-07-19

2005-07-19

Bennett, Henry (Department: 3743)

Drying and gas or vapor contact with solids

Apparatus

With means to treat gas or vapor

C034S078000, C034S092000, C034S630000

Reexamination Certificate

active

06918192

ABSTRACT:
A substrate drying system for drying substrates after the substrates are washed typically using deionized water, is disclosed. The substrate drying system comprises a substrate cleaning tank in which the substrates are washed. A dry pump is provided in fluid communication with the substrate cleaning tank. A container which contains a supply of a liquid drying fluid, typically isopropyl alcohol (IPA), is further provided in fluid communication with the substrate cleaning tank. In application, the dry pump induces a reduced pressure inside the substrate cleaning tank and the drying fluid container. This reduces the vapor pressure, and thus, the boiling point of the drying fluid, such that the drying fluid is vaporized and remains in a vaporized state throughout transit to the substrate cleaning tank and during drying of the substrate. Consequently, premature condensation of the drying fluid in the substrate cleaning tank is prevented, eliminating the formation of water marks and deposit of particles particularly in deep trenches formed in the substrate.

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