Substrate drying method and apparatus

Details Substrate drying method and apparatus Substrate drying method and apparatus

2006-09-19

2006-09-19

Lu, Jiping (Department: 3749)

Drying and gas or vapor contact with solids

Apparatus

With automatic control

C034S209000, C134S030000, C134S032000, C134S095200, C134S102300, C134S902000

Reexamination Certificate

active

07107701

ABSTRACT:
There are provided a substrate drying method and apparatus by which an attachment amount of particles to surfaces of substrates can be reduced when the substrates are exposed from pure water, and occurrence of non-uniform drying can be prevented by improving drying efficiency of the substrates. Air or an inert gas, and gaseous or droplet-like isopropyl alcohol (hereinafter, referred to as IPA) are supplied into a space on a liquid level of the pure water in a drying chamber, and pure water on a liquid level side is drained from the liquid level or the vicinity of the liquid level of the pure water, while raising the pure water in which the substrates are immersed together with the substrates, the substrates are exposed from the pure water above the liquid level in the drying chamber, and, at the same time, the pure water held on the exposed surfaces of the substrates is replaced by IPA, whereby the substrates are dried.

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