Substrate drying apparatus

Details Substrate drying apparatus Substrate drying apparatus

1995-11-28

1997-08-19

Bennett, Henry A.

Drying and gas or vapor contact with solids

Apparatus

With means to treat gas or vapor

34 73, 34468, 34477, F26B 2106

Patent

active

056575530

ABSTRACT:
A substrate drying apparatus comprises a treatment vessel for containing IPA in the form of liquid, an IPA source for supplying IPA into the treatment vessel, a first heat exchanger which is equipped with a heat exchanger tube dipped in IPA and allowing steam to pass therein, the first heat exchanger allowing the steam and IPA to perform heat exchange therebetween to thereby evaporate IPA, and a second heat exchanger provided on or above an upper portion of the treatment vessel and equipped with a heat exchanger tube for allowing a coolant to pass therein, the second heat exchanger allowing the coolant and the evaporated IPA to perform heat exchange therebetween to thereby condense the evaporated IPA.

REFERENCES:
patent: 4393657 (1983-07-01), Takatama
patent: 4800362 (1989-01-01), Sasaki et al.
patent: 4822429 (1989-04-01), McCord
patent: 5315766 (1994-05-01), Roberson, Jr. et al.
patent: 5369891 (1994-12-01), Kamikawa
patent: 5443540 (1995-08-01), Kamikawa
patent: 5539995 (1996-07-01), Bran

Affiliated with

Also associated with

Rating

Substrate drying apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Substrate drying apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate drying apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1097111