Optics: measuring and testing – Inspection of flaws or impurities
Reexamination Certificate
2007-01-23
2008-08-12
Nguyen, Sang (Department: 2886)
Optics: measuring and testing
Inspection of flaws or impurities
C356S237400, C356S237500, C382S154000
Reexamination Certificate
active
07411669
ABSTRACT:
In the present invention, data on a substrate image picked up by an image pickup unit is outputted to a difference calculation unit where a difference image from a normal substrate is calculated. A synthesis calculation unit calculates a synthesized image by rotating the difference image 360 degrees by every predetermined angle about the center of the substrate and synthesizing the images. A Zernike calculation unit digitizes the synthesized image by a Zernike polynomial and outputs a concentric circle component to a determination unit where the component is compared with a previously set threshold value, so that the presence or absence of a defect on the substrate is determined. The present invention can facilitate the determination of the presence or absence of a macro defect on the substrate and reduce the time required for the determination.
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Shinozuka Shinichi
Tomita Hiroshi
Nguyen Sang
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
Tokyo Electron Limited
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