Substrate defect inspection method, computer readable...

Optics: measuring and testing – Inspection of flaws or impurities

Reexamination Certificate

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C356S237400, C356S237500, C382S154000

Reexamination Certificate

active

07411669

ABSTRACT:
In the present invention, data on a substrate image picked up by an image pickup unit is outputted to a difference calculation unit where a difference image from a normal substrate is calculated. A synthesis calculation unit calculates a synthesized image by rotating the difference image 360 degrees by every predetermined angle about the center of the substrate and synthesizing the images. A Zernike calculation unit digitizes the synthesized image by a Zernike polynomial and outputs a concentric circle component to a determination unit where the component is compared with a previously set threshold value, so that the presence or absence of a defect on the substrate is determined. The present invention can facilitate the determination of the presence or absence of a macro defect on the substrate and reduce the time required for the determination.

REFERENCES:
patent: 5367375 (1994-11-01), Siebert
patent: 6809797 (2004-10-01), Baselmans et al.
patent: 7027143 (2006-04-01), Stokowski et al.
patent: 7038773 (2006-05-01), Kuhlmann et al.
patent: 6-18436 (1994-01-01), None
patent: 2000-235949 (2000-08-01), None
patent: 2001-168010 (2001-06-01), None
patent: 2004-85503 (2004-03-01), None

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