Substrate cutting method

Stone working – Sawing – Rotary

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C083S056000, C083S365000, C083S368000, C083S821000, C438S011000, C438S018000, C438S462000

Reexamination Certificate

active

07077120

ABSTRACT:
A method of producing a semiconductor device constructed by arranging a plurality of substrates, on each of which, thin film semiconductor elements two-dimensionally arranged are installed. The method includes the steps of cutting a substrate along at least a slice line provided on the substrate and on a side facing another substrate, which is one of the substrates when the plurality of substrates are arranged, while detecting a misalignment of a cutting position from the slice line and correcting a cutting position, cutting the substrate of a side opposing the slice line without correcting the cutting position, and adjacently arranging the plurality of substrates on substantially a same plane such that the sides having been cut face each other, while correcting the cutting position of the substrates.

REFERENCES:
patent: 3276492 (1966-10-01), Kervefors
patent: 3398620 (1968-08-01), Gautron
patent: 3976384 (1976-08-01), Matthews et al.
patent: 4611517 (1986-09-01), Schmale
patent: 5059899 (1991-10-01), Farnworth et al.
patent: 5327353 (1994-07-01), Nagano
patent: 0660421 (1995-06-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Substrate cutting method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Substrate cutting method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate cutting method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3610101

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.