Refrigeration – Processes – Treating an article
Patent
1995-11-17
1997-06-17
Doerrler, William
Refrigeration
Processes
Treating an article
62 65, 236 78D, H01L 2102
Patent
active
056386877
ABSTRACT:
In a substrate cooling apparatus for cooling a substrate placed on or adjacent a cooling plate having Peltier elements, the substrate is cooled quickly by controlling the Peltier elements to cool the cooling plate to a second set temperature below a target temperature to which the substrate is to be cooled, and switching control of the Peltier elements at a predetermined time after the substrate is placed on or adjacent the cooling plate, to increase the temperature of the cooling plate to the target temperature. Alternatively, the substrate may be cooled quickly by controlling the Peltier elements to cool the cooling plate to a predetermined temperature, controlling the Peltier elements at a normalized maximum cooling output when the substrate is placed on or adjacent the cooling plate, determining, when the cooling plate reaches a peak of temperature increase, a lower limit temperature related to the peak of temperature increase, and switching control of the Peltier elements, when the cooling plate reaches the lower limit temperature, to bring the cooling plate to the target temperature.
REFERENCES:
patent: 3111008 (1963-11-01), Nelson
patent: 3438214 (1969-04-01), Schmittle
patent: 5411076 (1995-05-01), Matsunaga et al.
Matsunaga Minobu
Mizohata Yasuhiro
Dainippon Screen Mfg. Co,. Ltd.
Doerrler William
LandOfFree
Substrate cooling method and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Substrate cooling method and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate cooling method and apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2151156