Substrate container cassette, interface mechanism, and substrate

Photocopying – Projection printing and copying cameras – With developing

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355 53, 414935, 414938, G03B 2732, G03B 2742, B65G 6523

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active

058415157

ABSTRACT:
A substrate processing apparatus having improved processing and cleanliness characteristics is provided with a developer unit (160) and an exposure unit (170) that are positioned with operation parts of these units being arranged linearly. An interface mechanism (IFD), disposed between the developer unit (160) and the exposure unit (170), includes a substrate transport apparatus (TR2) which supports a peripheral portion of a substrate while transporting the latter. The interface mechanism (IFD) also includes a substrate container cassette (120) serving as a substrate buffer in which a substrate is supported from the back by three pins. Ejection of a substrate from an indexer (IDA) is controlled in accordance with the number of substrates which are present in a reciprocal path between the processing units (160) and (170).

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Monthly Magazine, Semiconductor World, Extra Edition, Chapter 1: 1996 The Latest Semiconductor Processing Technique "Lithography Technique" (pp. 118-119) by Dainippon Screen Mfg. including an English Abstract.

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