Substrate cleaning method, substrate cleaning apparatus,...

Details Substrate cleaning method, substrate cleaning apparatus,... Substrate cleaning method, substrate cleaning apparatus,...

2011-03-29

2011-03-29

Barr, Michael (Department: 1711)

Cleaning and liquid contact with solids

Apparatus

With plural means for supplying or applying different fluids...

C134S001000, C134S001300, C134S902000

Reexamination Certificate

active

07913702

ABSTRACT:
In a substrate cleaning method for cleaning a backside of a substrate on a surface of which a predetermined processing is performed, a two phase substance contacts the backside of the substrate, and a flow of the substance is generated near the backside of the substrate under a specified pressure. The two phase substance is a gas containing aerosol or a supercritical substance, and the specified pressure is higher than or equal to 133 Pa (1 Torr). Further, in the substrate cleaning method, a high-energy light may be irradiated on the backside of the substrate.

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