Substrate cleaning method and substrate cleaning apparatus

Details Substrate cleaning method and substrate cleaning apparatus Substrate cleaning method and substrate cleaning apparatus

2005-09-20

2005-09-20

Kornakov, M. (Department: 1746)

Cleaning and liquid contact with solids

Apparatus

Automatic controls

C134S094100, C134S096100, C134S098100, C134S099100, C134S103200, C134S104100, C134S105000, C134S106000, C134S137000, C134S151000, C134S164000, C134S198000, C134S199000

Reexamination Certificate

active

06945259

ABSTRACT:
A substrate cleaning apparatus is provided that includes a cleaning cup for receiving a to-be-cleaned substrate, a table in the cleaning cup, a first, second, and third nozzles, a pure water heating mechanism configured to supply hot pure water, a branch line, a control mechanism, and an open/close valve, provided between the branch line and the pipe, wherein the open/close valve is configured to interrupt emission of hot water from the third nozzle by opening the open/close valve to lower the pressure in the pipe.

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