Substrate cleaning method

Details Substrate cleaning method Substrate cleaning method

2007-11-27

2007-11-27

Barr, Michael (Department: 1746)

Cleaning and liquid contact with solids

Processes

Combined

C134S001300, C134S006000, C134S033000, C134S037000

Reexamination Certificate

active

11235008

ABSTRACT:
A substrate cleaning apparatus includes an indexer, a front surface cleaning unit for cleaning the front surface of a substrate, a back surface cleaning unit for cleaning the back surface of the substrate, a particle inspecting unit for detecting a distribution of particles adhering to the substrate, a reversing unit for reversing the substrate, and a transport section having a pair of transport units. Cleaning conditions of the front surface cleaning unit or back surface cleaning unit are varied based on the distribution of particles on the substrate after the substrate is cleaned by the front surface cleaning unit or back surface cleaning unit and inspected by the particle inspecting unit.

REFERENCES:
patent: 5701627 (1997-12-01), Matsumura et al.
patent: 5756155 (1998-05-01), Tzeng et al.
patent: 5865901 (1999-02-01), Yin et al.
patent: 6059891 (2000-05-01), Kubota et al.
patent: 2002/0189758 (2002-12-01), Shiga et al.
patent: 2000-243796 (2000-09-01), None
patent: 2001-195731 (2001-07-01), None

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