Substrate cleaning/drying equipment and substrate cleaning/dryin

Details Substrate cleaning/drying equipment and substrate cleaning/dryin Substrate cleaning/drying equipment and substrate cleaning/dryin

1998-12-07

2000-11-28

Stinson, Frankie L.

Cleaning and liquid contact with solids

Processes

Work handled in bulk or groups

134 952, 134105, 134902, B08B 310

Patent

active

061521531

ABSTRACT:
There is provided a substrate cleaning/drying equipment for removing residual moisture from a substrate by exposing the substrate to an IPA steam after the substrate has been cleaned by a ultra pure water. The substrate cleaning/drying equipment comprises a cleaning/drying chamber for cleaning/drying the substrate, a cleaning tub which is provided below the cleaning/drying chamber and to which at least a ultra pure water is supplied, an IPA steam supplying pipe for supplying the IPA steam to an upper area of the cleaning/drying chamber such that the upper area of the cleaning/drying chamber is filled with the IPA steam, a steam supplying pipe for supplying a steam between the ultra pure water in the cleaning tub and the IPA steam, and a carrying unit for carrying the substrate, which has been cleaned by the ultra pure water, from the ultra pure water into the IPA steam via the steam. The ultra pure water, the steam, the IPA steam may be supplied onto the substrate by using injection nozzles respectively in order of the ultra pure water, the steam, the IPA steam.

REFERENCES:
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patent: 3742904 (1973-07-01), Bishop
patent: 4186032 (1980-01-01), Ham
patent: 4581133 (1986-04-01), Tomes
patent: 5443540 (1995-08-01), Kamikawa
patent: 5469876 (1995-11-01), Gray et al.
patent: 5520744 (1996-05-01), Fujikawa et al.
patent: 5608974 (1997-03-01), Tanaka et al.
patent: 5934299 (1999-08-01), Akatsu et al.
patent: 6001191 (1999-12-01), Kamikawa et al.
patent: 6050275 (1998-08-01), Kamikawa et al.

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