Substrate cleaning device and substrate processing facility

Details Substrate cleaning device and substrate processing facility Substrate cleaning device and substrate processing facility

2008-04-22

2008-04-22

Redding, David A (Department: 3723)

Brushing, scrubbing, and general cleaning

Machines

With air blast or suction

C015S306100, C015S345000, C015S405000, C134S902000

Reexamination Certificate

active

10717620

ABSTRACT:
A substrate cleaning device is provided, which comprises a first cleaning room including a first cleaning portion for cleaning a substrate placed therein, and a second cleaning room including a second cleaning portion for cleaning a substrate provided therein. The first cleaning room is stacked on the second cleaning room so that at least a portion of the first cleaning room overlaps at least a portion of the second cleaning room.

REFERENCES:
patent: 5226437 (1993-07-01), Kamikawa et al.
patent: 5265632 (1993-11-01), Nishi
patent: 5311893 (1994-05-01), Nishi
patent: 7047984 (2006-05-01), Blattner et al.
patent: 6-163505 (1994-06-01), None
patent: 6-165960 (1994-06-01), None
patent: 9-15547 (1997-01-01), None
patent: 2003-007662 (2003-01-01), None
patent: 1992-0022411 (1992-12-01), None
patent: 2002-0087637 (2002-11-01), None

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