Substrate cleaning device and substrate cleaning method

Details Substrate cleaning device and substrate cleaning method Substrate cleaning device and substrate cleaning method

2006-08-25

2011-10-18

Kornakov, Michael (Department: 1714)

Cleaning and liquid contact with solids

Apparatus

With plural means for supplying or applying different fluids...

C134S095100, C134S095200, C134S095300, C134S036000, C134S033000, C134S103200, C134S148000, C134S157000

Reexamination Certificate

active

08037890

ABSTRACT:
A substrate cleaning device and a substrate cleaning method reduces liquid drops remaining on a substrate to prevent the irregular heating of the substrate by a heating process due to liquid drops or water marks remaining on the substrate. A cleaning liquid is poured through a cleaning liquid pouring nozzle onto the surface of a substrate such that a region onto which the cleaning liquid is poured moves from a central part toward the circumference of the substrate. A gas is jetted radially outward at a region on the surface of the substrate behind a region onto which the cleaning liquid is poured with respect to the rotating direction of the substrate. The gas forces a liquid film of the cleaning liquid flowing on the surface of the substrate to flow in a circumferential direction and a radially outward direction.

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