Substrate cleaning device

Details Substrate cleaning device Substrate cleaning device

1989-05-18

1991-10-08

Lawrence, Evan

Coating apparatus

Gas or vapor deposition

With treating means

118 501, C23C 1602

Patent

active

050544217

ABSTRACT:
A substrate cleaning device comprises a gas jet nozzle for jetting gas toward a substrate, an electron beam irradiation selection for irradiating electron beams into the jetted gas to induce glow discharge, and an ion acceleration section for drawing ions out of the glow discharge to impart the ions with energy, causing the ions to uniformly bombard onto the substrate.

REFERENCES:
patent: 4147573 (1979-04-01), Morimoto
patent: 4161418 (1979-07-01), Morimoto
patent: 4645977 (1987-02-01), Kurokawa et al.
patent: 4676194 (1987-06-01), Satou et al.
European Search Report, Application No. EP 87110160.6, Nov. 24, 1987.
Patent Abstracts of Japan, Unexamined Applications, C Field, vol. 9, No. 66, Mar. 26, 1985, The Patent Office, Japanese Government, pp. 157, 271, Abstract of Kokai No. 59-200753.

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